Excimer gas purification
US9478934B1 · kind B1 · utility
3Cited by
4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2015 |
| Grant date | Oct 25, 2016 |
| Priority date | — |
| Expiry date | Sep 29, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure relates to the removal of hydrogen fluoride (HF) from an excimer laser either in operation or in standby using a metal halide salt reactor. Removal of HF is desirable because the contaminant not only absorbs laser emission, thus reducing laser power, but it is also chemically reactive, and degrades the lifetime of internal laser components. The metal halide salt reactor may be provided either in the laser vessel or in an external conduit loop.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.