Plasma arc cutting system and persona selection process
US9481050B2 · kind B2 · utility
18Cited by
44References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 24, 2013 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Aug 12, 2034 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K10/00
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The invention features methods and apparatuses for establishing operational settings of a plasma arc cutting system. A plasma power supply includes a user selectable control. The user selectable control enables selection of a single cutting persona that establishes at least a current, a gas pressure or gas flow rate, and an operational mode of the plasma arc cutting system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.