Patent · US Active

Substrate detaching apparatus

US9481161B2 · kind B2 · utility

0Cited by
7References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 21, 2015
Grant dateNov 1, 2016
Priority date
Expiry dateOct 21, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1944
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention aims at reducing a breaking phenomenon of an adsorbed substrate while the substrate is detached from a lower plate at a high speed. An embodiment is a substrate detaching apparatus including an adsorption main body disposed on one side of the adsorbed substrate to generate an adsorption force; and a plurality of adsorption parts provided in a predetermined adsorption region of the substrate under the adsorption main body, being spaced apart from each other and applied with an adsorption force from the adsorption main body to adsorb the substrate, wherein the adsorption region includes an outer region of a first cycloid curved line protruding in a third corner direction based on a diagonal connecting between a first corner and a second corner of the adsorbed substrate and an outer region of a second cycloid curved line protruding in a fourth corner direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.