Patent · US Active

Method for producing synthetic quartz glass

US9481597B2 · kind B2 · utility

4Cited by
12References
2Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 13, 2012
Grant dateNov 1, 2016
Priority date
Expiry dateJan 9, 2033

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P40/57
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The invention relates to a method for producing synthetic quartz glass by vaporizing a polyalkylsiloxane as a liquid SiO2 feedstock (105), converting the vaporized SiO2 feedstock (107) into SiO2 particles, separating the SiO2 particles, forming a soot body (200) and vitrifying the soot body (200). According to the invention, the vaporizing of the heated SiO2 feedstock (105) comprises an injection phase in an expansion chamber (125), in which the SiO2 feedstock (105) is atomized into fine droplets, wherein the droplets have an average diameter of less than 5 pm, and wherein the atomizing of the droplets takes place in a preheated carrier gas stream which has a temperature of more than 180° C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.