Thin film deposition method and resulting product
US9481603B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2010 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Nov 2, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C23/007
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process for producing a substrate coated on a face with a low-E thin film multilayer, the process including: depositing a thin-film multilayer containing a thin silver film between at least two thin dielectric films and an absorbent film on a face a substrate; and heat treating the coated face with laser radiation between 500 and 2000 nm to reduce at least one selected from the group of the emissivity and the sheet resistance of the multilayer by at least 5%, wherein the absorbent film at least partially absorbs the laser radiation so that the absorption of the multilayer the wavelength of the laser radiation is such that the absorption of a clear glass substrate 4 mm in thickness coated with the multilayer at the wavelength of the laser radiation is greater than or equal to 10%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.