Solvent for reducing resist consumption and method using solvent for reducing resist consumption
US9482957B1 · kind B1 · utility
3Cited by
15References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 15, 2015 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | Jun 15, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides a solvent for reducing resist consumption, which includes a first solvent selected from the group consisting of alkylene glycol alkyl ether acetate, alkylene glycol alkyl ether and a combination thereof, and a second solvent having a hydrogen bonding Hansen parameter lower than 5.34 and an evaporation rate (n-BuAc=1) lower than 0.6. A volume ratio of the first solvent to the second solvent is in a range of 0/100 to 90/10. A resist dispense volume for a 300 mm wafer is less than 0.6 cc, or a resist dispense volume for a 450 mm wafer is less than 1.1 cc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.