Transmission balancing for phase shift mask with a trim mask
US9482965B2 · kind B2 · utility
2Cited by
16References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 2, 2016 |
| Grant date | Nov 1, 2016 |
| Priority date | — |
| Expiry date | May 2, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Implementations described and claimed herein include photolithography technology to alleviate the imbalance of transmission intensity induced. In one implementation, a method comprises exposing an alternating phase shift mask (Alt-PSM) and a trim mask, wherein an exposure placement of the trim mask is shifted relative to an exposure placement of the Alt-PSM.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.