Patent · US Active

Sulfonyl photoacid generators and photoresists comprising same

US9488910B2 · kind B2 · utility

4Cited by
4References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 14, 2010
Grant dateNov 8, 2016
Priority date—
Expiry dateDec 14, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C2603/74
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.