Device for generating plasma having a high range along an axis by electron cyclotron resonance (ECR) from a gaseous medium
US9490102B2 · kind B2 · utility
0Cited by
7References
9Claims
0Family size
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Key dates
| Filing date | Sep 4, 2013 |
| Grant date | Nov 8, 2016 |
| Priority date | — |
| Expiry date | Oct 23, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/463
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The device includes at least two coaxial waveguides each formed of a central conductor and of an external conductor to bring microwaves into a treatment chamber. The at least two electromagnetic wave injection guides are combined with a magnetic circuit elongated in one direction. The magnetic circuit surrounding the waveguides by creating a magnetic field capable of achieving an ECR condition close to the waveguides.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.