High resolution projection micro stereolithography system and method

US9492969B2 · kind B2 · utility

Assignee

• Lawrence Livermore National Security, LLC · US

Inventors

• Christopher M. Spadaccini · Oakland, US
• George Roy Farquar · Livermore, US
• Todd Weisgraber · Brentwood, US
• Steven Gemberling · Livermore, US
• Nicholas Fang · Lexington, US
• Jun Xu · Longbeilingcun, CN
• Matthew Paul Alonso · Freeport, US
• Howon Lee · Seoul, KR

Key dates

• Filing date: May 31, 2011
• Grant date: Nov 15, 2016
• Expiry date: Aug 22, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03H2225/60
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A high-resolution PμSL system and method incorporating one or more of the following features with a standard PμSL system using a SLM projected digital image to form components in a stereolithographic bath: a far-field superlens for producing sub-diffraction-limited features, multiple spatial light modulators (SLM) to generate spatially-controlled three-dimensional interference holograms with nanoscale features, and the integration of microfluidic components into the resin bath of a PμSL system to fabricate microstructures of different materials.