Methods of manufacturing abrasive particle and polishing slurry
US9493679B2 · kind B2 · utility
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2References
9Claims
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Key dates
| Filing date | Oct 2, 2015 |
| Grant date | Nov 15, 2016 |
| Priority date | — |
| Expiry date | Oct 2, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2006/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided is a method of manufacturing an abrasive particle including a mother particle and a plurality of auxiliary particles formed on a surface of the mother particle, and a method of manufacturing a polishing slurry in which the abrasive particle is mixed with a polishing accelerating agent and a pH adjusting agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.