Manufacturing method of TFT array substrate, TFT array substrate and display device
US9494837B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2013 |
| Grant date | Nov 15, 2016 |
| Priority date | — |
| Expiry date | Sep 26, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136222
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the disclosure provide a manufacturing method of a TFT array substrate, a TFT array substrate and a display device. The method comprises steps of: S1. forming a thin film transistor on a base substrate; S2. forming a passivation layer thin film on the base substrate after the step S1; S3. forming a passivation layer via hole and a light-shielding pattern on the base substrate after the step S2; and S4. forming a color filter layer and a pixel electrode on the base substrate after the step S3. The pixel electrode is electrically connected to a drain electrode of the thin film transistor through the passivation layer via hole, and the color filter layer is in correspondence with a position of the pixel electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.