Substrate processing apparatus
US9494877B2 · kind B2 · utility
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2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2012 |
| Grant date | Nov 15, 2016 |
| Priority date | — |
| Expiry date | Nov 17, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/707
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes an indexer block, a first processing block, a second processing block, and an interface block. The indexer block includes a pair of carrier platforms and a transport section. A carrier storing a plurality of substrates in multiple stages is placed in each of the carrier platforms. The transport section includes transport mechanisms. The transport mechanisms concurrently transport the substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.