Automated nital etch inspection system
US9501820B2 · kind B2 · utility
3Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2014 |
| Grant date | Nov 22, 2016 |
| Priority date | — |
| Expiry date | Aug 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2101/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method to inspect flaws associated with a part. The system includes a first image capturing device configured to capture a first set of images of the part and a computer operably associated with first image capturing device and configured to receive and analyze the first set of images. The method includes treating the part with a nital etchant solution, capturing a first set of images of an outer surface of the part with the first image capturing device, and identifying a part defect with an algorithm associated with the computer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.