Patent · US Active

Visibility silhouettes for masked spherical integration

US9501862B2 · kind B2 · utility

0Cited by
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12Claims
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Key dates

Filing dateDec 3, 2012
Grant dateNov 22, 2016
Priority date
Expiry dateFeb 14, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T15/40
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

The disclosure provides an approach for determining, in 3D rendering, the integrals of visibility-masked spherical functions using visibility silhouettes. For a given shade point, the visibility silhouette for that shade point includes a set of edges from the scene geometry which form the boundaries between visible and invisible regions of a hemisphere having the shade point as its center. For each shade point, a rendering application determines a set of contour edges of scene geometry, the contour edges being a superset of the set of visibility silhouette edges, by querying a 4D dual mesh. The rendering application then evaluates the integral of the visibility-masked spherical function for a given shade point by integrating over segments of discrete u-isolines for which an overlap function indicates that a ray from the shade point would not intersect scene geometry.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.