Ultraviolet systems and methods for irradiating a substrate
US9502149B2 · kind B2 · utility
0Cited by
9References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2014 |
| Grant date | Nov 22, 2016 |
| Priority date | — |
| Expiry date | Aug 11, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B20/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A UV system for irradiating a substrate includes a lamphead having an enclosure with an interior. A UV bulb is positioned in the interior and is capable of emitting UV energy when excited by RF energy. The UV system also includes a solid state RF source capable of generating the RF energy. The RF energy is transmitted to the UV bulb, which causes the UV bulb to ignite and emit the UV energy from the interior of the lamphead.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.