Method for forming a thin-film layer pattern, display substrate and manufacturing method thereof, and display device
US9502444B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 27, 2014 |
| Grant date | Nov 22, 2016 |
| Priority date | — |
| Expiry date | Jun 27, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming a thin-film layer pattern, a display substrate and a manufacturing method thereof, and a display device are provided. The method for forming the thin-film layer pattern comprises: forming a first thin-film layer to be patterned on a substrate; forming a first overcoat (OC) layer on a surface of the first thin-film layer; forming a first overcoat layer pattern by beam melting; and removing the first thin-film layer not covered by the first overcoat layer pattern to form a first thin-film layer pattern. The method adopts beam melting process and hence can improve the accuracy and the resolution of the display substrate, improve the product quality and reduce the manufacturing cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.