Method and optical device for super-resolution localization of a particle
US9507134B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2012 |
| Grant date | Nov 29, 2016 |
| Priority date | — |
| Expiry date | Jul 10, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/58
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A super-resolution microscopy method includes forming an image of an emitting particle in a detection plane of a detector by a microscopy imaging system and correcting, by a wavefront-modulating device, at least some of the optical defects present between the emitting particle and the detection plane. The method further includes introducing, via the wavefront-modulating device, a deformation of the wavefront emitted by the emitting particle, of variable amplitude, allowing a bijective relationship to be formed between the shape of the image of the emitting particle in the detection plane and the axial position of the emitting particle relative to an object plane that is optically conjugated with the detection plane by the microscopy imaging system. The method further includes controlling the amplitude of the deformation of the wavefront by controlling the wavefront-modulating device, as a function of the given range of values of the axial position of the particle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.