Patent · US Active

Method for transferring surface textures, such as interference layers, holograms and other highly refractive optical microstructures

US9507320B2 · kind B2 · utility

1Cited by

20References

8Claims

0Family size

Assignee

LEIBNIZ-INSTITUT FUER NEUE MATERIALIEN GEMEINNUETZIGE GESELLSCHAFT MIT BESCHRAENKTER HAFTUNG · DE

Inventors

Peter W. Oliveira · Riegelsberg, DE
Bruno Schaefer · Losheim, DE
Christine Faller-Schneider · Völklingen, DE
Michael Veith · Sankt Ingbert, DE

Key dates

Filing date	Feb 14, 2008
Grant date	Nov 29, 2016
Priority date	—
Expiry date	Jan 28, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03H2250/10
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention relates to a method for transferring surface structures such as interference layers, holograms, and other highly refractive optical microstructures to substrates. The aim of the invention is to devise a method which is used for transferring surface structures such as interference layers, holograms, and other highly refractive optical microstructures to substrates and can also be used in a high temperature range. The aim is achieved by a method comprising the following steps: a) a flexible intermediate support layer is applied to a support film as a release layer; b) an embossed sol is applied to the intermediate support layer and is provided with a surface structure; c) a stack encompassing a binder layer and the surface structure is produced; d) the support film is removed; e) the workpiece is thermally treated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.