Patent · US Active

Method for testing susceptor of chemical vapor deposition apparatus and method for manufacturing organic light emitting display apparatus by using the same

US9508613B2 · kind B2 · utility

0Cited by
2References
14Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 7, 2014
Grant dateNov 29, 2016
Priority date
Expiry dateJan 7, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/164
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method for testing a susceptor of a chemical vapor deposition (CVD) apparatus includes preparing a substrate including a transparent conductive layer, disposing the substrate with the transparent conductive layer on the susceptor of the CVD apparatus, and determining whether or not the susceptor of the CVD apparatus is normal by measuring a surface resistance across the transparent conductive layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.