Method for testing susceptor of chemical vapor deposition apparatus and method for manufacturing organic light emitting display apparatus by using the same
US9508613B2 · kind B2 · utility
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2References
14Claims
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Key dates
| Filing date | Jan 7, 2014 |
| Grant date | Nov 29, 2016 |
| Priority date | — |
| Expiry date | Jan 7, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/164
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for testing a susceptor of a chemical vapor deposition (CVD) apparatus includes preparing a substrate including a transparent conductive layer, disposing the substrate with the transparent conductive layer on the susceptor of the CVD apparatus, and determining whether or not the susceptor of the CVD apparatus is normal by measuring a surface resistance across the transparent conductive layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.