Methods of forming solar cells

US9508887B2 · kind B2 · utility

Assignee

• TETRASUN, INC. · US

Inventors

• Douglas E. Crafts · San Jose, US
• Oliver Schultz-Wittmann · Sunnyvale, US
• Adrian Bruce Turner · Bitterfeld-Wolfen, DE
• Qin Yang Ong · San Leandro, US

Key dates

• Filing date: Oct 24, 2013
• Grant date: Nov 29, 2016
• Expiry date: Oct 24, 2033

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E10/50

Abstract

Methods of fabricating conductive patterns over a solar cell structure are provided, in which a patterned resist layer is provided over an anti-reflective coating layer formed over a solar cell structure. The patterned resist layer is used to etch the exposed portion of the anti-reflective coating, and a metal seed layer is provided over the resist layer and the exposed portion of the solar cell structure's surface. The metal seed layer is selectively removed from over the patterned resist layer without removal from the exposed portion of the surface of the solar cell structure. Different thermal conductivities of the patterned resist layer and the solar cell structure's surface facilitate the selective removal of the seed layer from over the resist layer. Also provided are methods of facilitating simultaneous fabrication of conductive patterns over a plurality of solar cell structures using one or more frame structures.