Polymerizable oligomer and photoresist composition comprising the same
US9512242B2 · kind B2 · utility
0Cited by
4References
19Claims
0Family size
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Key dates
| Filing date | Jun 27, 2013 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | Apr 21, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2810/30
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The embodiments of the invention provide a polymerizable oligomer and a photoresist composition including the polymerizable oligomer, wherein the polymerizable oligomer contains a polymerizable double bond and a hydrophilic group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.