Patent · US Active

Process for producing a photomask on a photopolymeric surface

US9513551B2 · kind B2 · utility

1Cited by

56References

16Claims

0Family size

Assignee

DIGIFLEX LTD. · IL

Inventors

Moshe Frenkel · Jerusalem, IL
Yaacov Mazuz · Yavne, IL
Oleg Berezin · 'Anata, IL
Natalia Ivanova · Jerusalem, IL

Key dates

Filing date	Jan 27, 2010
Grant date	Dec 6, 2016
Priority date	—
Expiry date	Oct 4, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/50
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A process is provided for printing a high resolution pattern on a photopolymeric surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.