Deposition device including laser mask and deposition method using the same
US9515296B2 · kind B2 · utility
1Cited by
0References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 17, 2015 |
| Grant date | Dec 6, 2016 |
| Priority date | — |
| Expiry date | Nov 17, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/421
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition device including a chamber configured to accommodate a substrate supported on a stage, a deposition source configured to discharge material toward the substrate, and a laser mask system configured to form a laser mask between the substrate and the stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.