Patent · US Active

Method for producing a doped SiO2 slurry and use of the SiO2 slurry

US9518218B2 · kind B2 · utility

0Cited by

4References

11Claims

0Family size

Assignee

HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

Mario Such · Gräfenhainichen, DE
Gerhard Schoetz · Aschaffenburg, DE
Andreas Langner · Alzenau, DE

Key dates

Filing date	Jun 25, 2013
Grant date	Dec 13, 2016
Priority date	—
Expiry date	Jan 28, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2201/36
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

The invention relates to a method for producing a doped SiO2 slurry in which an SiO2 suspension is brought into interaction with at least one doping solution, wherein the SiO2 suspension and/or the doping solution act on one another in the form of an atomized spray, the average droplet diameter of which is in the range between 10 μm and 100 μm. The invention further relates to the use of an SiO2 slurry doped by the atomized spray method for the production of doped quartz glass, particularly for the production of laser-active quartz glass.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.