Patent · US Active

Method of fabricating improved porous metallic material and resulting structure thereof

US9518335B2 · kind B2 · utility

5Cited by

0References

9Claims

0Family size

Assignee

CITY UNIVERSITY OF HONG KONG · CN

Inventors

Jie Zhang · Beijing, CN
Yang Li · Santa Clara, US
Jian Lu · Kowloon, CN

Key dates

Filing date	Jan 2, 2014
Grant date	Dec 13, 2016
Priority date	—
Expiry date	Jun 26, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC25F3/02
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A porous metallic material for making a structure is fabricated by subjecting the material structure to Surface Mechanical Attrition Treatment (SMAT) once, using the SMAT-treated structure as an electrode, and selectively etching away at least one metal component in the SMAT-treated structure once, thus forming an etched-away structure. Additional SMAT treatment and/or etching treatment to the etched away structure may be performed. The resulting structure has improved physical characteristics.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.