Optically transparent and electrically conductive coatings and method for their deposition on a substrate

US9519209B2 · kind B2 · utility

Assignees

• FUNDACIÓ INSTITUT DE CIENCIES FOTÒNIQUES · ES
• Cark Zeiss SMT GmbH · DE

Inventors

• Valerio Pruneri · Barcelona, ES
• Albert Carrilero · Cardedeu, ES
• Jan Hendrik Peters · Wuppertal, DE

Key dates

• Filing date: Oct 12, 2012
• Grant date: Dec 13, 2016
• Expiry date: Feb 22, 2033

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/38
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.