Dynamic optical head layer and lithography method using the same
US9519222B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2015 |
| Grant date | Dec 13, 2016 |
| Priority date | — |
| Expiry date | Apr 17, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7015
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a dynamic optical head layer in an optical lithography system forming patterns on a substrate, the dynamic optical head layer being detachably mounted on the substrate, and the dynamic optical head layer includes a first dielectric layer formed on a top portion thereof, a second dielectric layer formed on a bottom portion thereof, and an dynamic nano aperture layer formed between the first dielectric layer and the second dielectric layer, wherein the dynamic nano aperture layer is made of a material having optical anisotropy, and the first dielectric layer and the second dielectric layer are made of oxide-based materials, nitride-based materials, and carbide-based materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.