Micropattern generation with pulsed laser diffraction
US9527730B2 · kind B2 · utility
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8References
19Claims
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Key dates
| Filing date | Sep 3, 2013 |
| Grant date | Dec 27, 2016 |
| Priority date | — |
| Expiry date | May 24, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2035/0838
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Methods and devices for preparing microscale polymer relief structures from a thin polymer layer on an absorbing substrate are described. The described methods are ultrafast (about 8 nanoseconds) and allow formation of patterned microstructures having complex morphologies and narrow line widths that are an order of magnitude smaller than the masks used in the methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.