Patent · US Active

Quartz glass manufacturing method using hydrogen obtained by vaporizing liquid hydrogen

US9527764B2 · kind B2 · utility

0Cited by
3References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 19, 2014
Grant dateDec 27, 2016
Priority date
Expiry dateJun 21, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P40/57
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Provided is a quartz glass manufacturing method that involves using one or more burners, supplying hydrogen and oxygen to the one or more burners to generate an oxyhydrogen flame, introducing a silicide into the oxyhydrogen flame, forming a porous base material by depositing silicon dioxide generated from a flame hydrolysis reaction with the silicide, and heating and sintering the porous base material to form transparent glass, the method comprising supplying hydrogen that is stored or made at a normal temperature to the one or more burners; controlling a hydrogen flow rate using a measurement apparatus or control apparatus that performs measurement based on heat capacity of a gas; vaporizing liquid hydrogen stored in a low-temperature storage chamber, and supplying the vaporized liquid hydrogen to the one or more burners as backup hydrogen; switching from the hydrogen to the backup hydrogen; and when switching, adjusting the hydrogen flow rate to a value obtained by multiplying the hydrogen flow rate immediately after switching by a predetermined correction coefficient.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.