Swash plate
US9528504B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2013 |
| Grant date | Dec 27, 2016 |
| Priority date | — |
| Expiry date | Dec 14, 2033 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05C2253/20
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
The outer periphery of the outer part of a substrate is a chamfer, and the outer part of the substrate is covered by a resin film layer. The thickness of the resin film layer at the chamfer is thicker than the locations radially further inwards from said chamfer. The surface of the resin film layer on the outer peripheral edge of the outer part is coplanar with the surface of the resin film layer further inwards. These locations act as the sliding surface (the surface of the swash plate) that slides on a shoe, and compared with conventional techniques, because the resin film layer in the outer peripheral edge is thick, attrition of the portion being pressed against the shoe is suppressed. For that reason, the outer peripheral edge of the substrate and the vicinity thereof are prevented from being exposed, and seizure of the swash plate can be prevented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.