Mask-mounting apparatus for exposure machine
US9529281B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 28, 2013 |
| Grant date | Dec 27, 2016 |
| Priority date | — |
| Expiry date | Apr 28, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70991
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask-mounting apparatus for an exposure machine, which comprises: a mask frame (8) for securing a mask (9); a gas cell (6, 7) provided beneath the mask frame (8), for supporting the mask frame (8); and a gas-supply unit communicating through a gas-supply pipeline with the gas cell (6, 7); the gas-supply pipeline is provided thereon with a pneumatic switch valve (10, 11). In the event of interruption of supply from the gas-supply unit, the pneumatic switch valve shuts off the gas-supply pipeline to prevent the gas cell from being deflated. With provision of a pneumatic switch valve on the gas-supply pipeline connected with the gas cell, it can be achieved that, after an interruption of the supply from the gas-supply unit, the pneumatic switch valve automatically switches to a non-energized state, thus sealing the gas in the gas cell, and avoiding the detachment of the mask frame caused by deflation of the gas cell. After the normal supply of the gas-supply unit, the pneumatic switch valve controls the gas-supply pipeline to continue supplying gas to the gas cell, thus avoiding the risks of detachment of the mask frame caused by the interruption of the supply of the gas-supply unit…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.