Light source with nanostructured antireflection layer
US9530636B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2015 |
| Grant date | Dec 27, 2016 |
| Priority date | — |
| Expiry date | Mar 17, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/32
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A laser-sustained plasma light source includes a plasma cell configured to contain a volume of gas. The plasma cell is configured to receive illumination from a pump laser in order to generate plasma within the volume of gas. The plasma emits broadband radiation. The plasma cell includes one or more transparent portions being at least partially transparent to at least a portion of illumination from the pump laser and at least a portion of the broadband radiation emitted by the plasma. The plasma cell also includes one or more nanostructured layers disposed on one or more surfaces of the one or more transparent portions of the plasma cell. The one or more nanostructure layers form a region of refractive index control across an interface between the one or more transparent portions of the plasma cell and an atmosphere.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.