Patent · US Revoked

Artificial skin

US9532981B2 · kind B2 · utility

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3Claims
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Key dates

Filing dateSep 25, 2014
Grant dateJan 3, 2017
Priority date
Expiry dateOct 21, 2034

Classification

  • Technology area (CPC —)General

Abstract

The present invention relates to a method for producing artificial skin, comprising: adding a matrix metalloproteinase inhibitor and a heparanase inhibitor to an artificial skin formation culture medium comprising human epidermal keratinocytes and human dermal fibroblasts, culturing the cells in the artificial skin formation culture medium, and forming artificial skin.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.