Patent · US Active

Reflective features with co-planar elements and processes for making them

US9533523B2 · kind B2 · utility

0Cited by

34References

21Claims

0Family size

Assignee

SICPA HOLDING SA · CH

Inventors

Richard Einhorn · Albuquerque, US
Mark J. Hampden-Smith · Albuquerque, US
Miodrag Oljaca · Avondale Estates, US
Jainisha Shah · Rio Rancho, US

Key dates

Filing date	Nov 21, 2013
Grant date	Jan 3, 2017
Priority date	—
Expiry date	Dec 11, 2033

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB41M5/0023
WIPO fieldTextile and paper machines
WIPO sectorMechanical engineering

Abstract

The invention relates to a reflective feature, e.g., reflective security feature or reflective decorative feature, comprising a first element at least partially coplanar with a second element. The first element causes incident light to be reflected with a first intensity that varies as the angle of incidence changes relative to a surface of the reflective feature. The invention also relates to a direct write printing process for forming such a reflective feature from an ink comprising metallic nanoparticles.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.