Patent · US Active

Vapour deposition process for the preparation of a phosphate compound

US9533886B2 · kind B2 · utility

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9References
22Claims
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Key dates

Filing dateJul 20, 2012
Grant dateJan 3, 2017
Priority date
Expiry dateDec 30, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention provides a vapour deposition process for the preparation of a phosphate compound, wherein the process comprises providing each component element of the phosphate compound as a vapour, and co-depositing the component element vapours on a common substrate, wherein the component elements react on the substrate to form the phosphate compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.