Polishing composition and method for nickel-phosphorous coated memory disks
US9534147B2 · kind B2 · utility
1Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2014 |
| Grant date | Jan 3, 2017 |
| Priority date | — |
| Expiry date | Oct 16, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/30625
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention provides a polishing composition that contains (a) α-alumina particles that have an average particle size of about 250 nm to about 300 nm, (b) a per-type oxidizing agent, (c) a complexing agent, wherein the complexing agent is an amino acid or an organic acid, and (d) water. The invention also provides a method of polishing a substrate, especially a nickel-phosphorous substrate, with the polishing composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.