Device manufacturing cleaning process using vaporized solvent
US9536757B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Sep 6, 2013 |
| Grant date | Jan 3, 2017 |
| Priority date | — |
| Expiry date | Jan 25, 2035 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/04
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning method using vaporized solvent is provided. A solvent-containing vapor is generated, wherein the solvent-containing vapor comprises a solvent. The solvent-containing vapor is conducted to a substrate having debris or contaminants to clean the substrate, wherein the solvent-containing vapor condenses to form a liquid on a surface of the substrate. The liquid phase of the solvent-containing vapor is changed to a solid phase. The solid phase of the solvent-containing vapor is changed back to a liquid phase. The substrate is spun dried to remove the solvent-containing vapor in liquid phase and any debris or contaminants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.