Patent · US Active

Substrate processing apparatus and substrate processing method

US9539607B2 · kind B2 · utility

4Cited by
2References
7Claims
0Family size

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Key dates

Filing dateJul 17, 2013
Grant dateJan 10, 2017
Priority date
Expiry dateAug 30, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/681
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A substrate is transported based on coordinates information indicating a receiving position of the substrate and a placement position of the substrate by a hand. If the substrate is shifted from a first position, the substrate is received by the hand while a center of the substrate is shifted from a normal position of the hand. The hand that holds the substrate is moved toward a second position. A plurality of portions at an outer periphery of the substrate are detected before the substrate is placed. A shift of the substrate with respect to the normal position of the hand is detected based on the detection result, and the coordinates information is corrected such that a shift between a position of the center of the substrate to be placed at the second position by the hand and the center of the second position is canceled.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.