Photocurable composition and method of manufacturing film using the composition
US9541826B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2013 |
| Grant date | Jan 10, 2017 |
| Priority date | — |
| Expiry date | Sep 20, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F222/102
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photocurable composition of the present invention to be used for manufacturing a film with high productivity is a photocurable composition to be used for manufacturing a film having a predetermined pattern shape by curing the photocurable composition with light under a state where the photocurable composition is brought into contact with a mold having concavo-convex on a surface thereof, the photocurable composition including: a polymerizable compound; a photopolymerization initiator; a photosensitive gas generating agent for generating a gas through light stimulation; and a gas generation promotor for increasing an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, in which the gas generation promotor includes a fluorine atom-containing surfactant that is free of a polymerizable substituent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.