Patent · US Active

System and method for producing particles and patterned films

US9545737B2 · kind B2 · utility

1Cited by
5References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 25, 2013
Grant dateJan 17, 2017
Priority date
Expiry dateFeb 1, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2982
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A system including a mold having a fluoropolymer wherein the mold defines a plurality of cavities having a predetermined shape and a cross-sectional dimension less than about 100 micrometers; a roller; a surface in cooperation with the roller to form a nip point configured to receive the mold, wherein the nip point is further configured to receive a substantially liquid composition and accelerate entry of the substantially liquid composition into the cavity. A method of forming particles including applying a substantially liquid composition to a mold, wherein the mold comprises a fluoropolymer and defines a plurality of cavities each having a broadest cross-sectional dimension of less than about 100 micrometers; nipping the mold between a roller and a surface such that the substantially liquid composition enters the cavities of the mold; and hardening the substantially liquid composition in the cavities of the mold to form a particle within each cavity, wherein the particle has a size and shape that substantially mimics the size and shape of the cavity of the mold.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.