Device and method for making photomask assembly and photodetector device having light-collecting optical microstructure
US9547231B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2014 |
| Grant date | Jan 17, 2017 |
| Priority date | — |
| Expiry date | Mar 29, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F77/413
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical mask can be made by providing a transparent mask substrate; depositing a first layer of opaque material, forming an aperture in the first layer; depositing a second layer of transparent material, depositing a third layer of transparent material; patterning the third layer to produce a disc-shaped region, heating the third layer until the disc-shaped region reflows into a lens-shaped region and cross-links, depositing a fourth layer, patterning the fourth layer to produce a cavity extending to the surface of the lens-shaped region, and dry etching the end of the cavity until the second layer develops a shape corresponding to the lens-shaped region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.