Feature mask determination for images
US9547908B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2015 |
| Grant date | Jan 17, 2017 |
| Priority date | — |
| Expiry date | Sep 28, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30196
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Implementations relate to feature mask determination for images. In some implementations, a computer-implemented method to determine a feature mask for an image includes estimating one or more prior regions in the image that define a feature in the image. The method determines superpixels based on multiple pixels of the image similar in color. The method constructs a graph, each node of the graph corresponding to a superpixel, and determines a superpixel score for each superpixel based on a number of pixels of the superpixel. The method determines one or more segmented regions in the image based on applying a graph cut technique to the graph based at least on the superpixel scores, and determines the feature mask based on the segmented regions. The feature mask indicates a degree to which pixels of the image depict the feature. The method modifies the image based on the feature mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.