Patent · US Active

Cleanliness monitoring system and cartridges thereof

US9551725B2 · kind B2 · utility

0Cited by
4References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 5, 2012
Grant dateJan 24, 2017
Priority date
Expiry dateAug 20, 2034

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2035/00881
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A system for monitoring cleanliness of a material handling system is disclosed. The system includes a measuring device, a first signal device, a second signal device, and a measuring host. The measuring device installed in the cartridges conduct the cleanliness measurements and obtains the measured result. The first signal device installed in the cartridges transforms the measured results to wireless signals. The second signal device installed in a predetermined location outside of the cartridges receives the wireless signal. The measuring host transforms the received wireless signals back to the measured results. The cartridges of the material handling system are also disclosed. The disclosed cleanliness monitoring system and the cartridge can reduce the cost.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.