Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions
US9551936B2 · kind B2 · utility
0Cited by
9References
12Claims
0Family size
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Key dates
| Filing date | Aug 1, 2012 |
| Grant date | Jan 24, 2017 |
| Priority date | — |
| Expiry date | Sep 3, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0273
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.