Method for tracking defects on a photomask across repeated inspections
US9557169B2 · kind B2 · utility
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2References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 13, 2013 |
| Grant date | Jan 31, 2017 |
| Priority date | — |
| Expiry date | May 10, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This invention allows tracking of a defect across multiple inspections. The inventive solution translates every inspection record into a common set of fields that are first archived into a relational database. Then the defect coordinates from the inspection records of the same mask are all transformed into a common reference frame having the same origin and orientation with respect to the mask coordinate system. Following this, the defect having coordinates within a given tolerance distance are paired up and reported to the user.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.