Integrated apertured micromirror and applications thereof
US9557556B2 · kind B2 · utility
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5References
27Claims
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Key dates
| Filing date | Mar 14, 2014 |
| Grant date | Jan 31, 2017 |
| Priority date | — |
| Expiry date | Apr 24, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/357
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An integrated apertured micromirror is provided in which the micromirror is monolithically integrated with a micro-optical bench fabricated on a substrate using a lithographic and deep etching technique. The micromirror has an aperture therein and is oriented such that the micromirror is optically coupled to receive an incident beam having an optical axis in a plane of the substrate and to at least partially transmit the incident beam therethrough via the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.