Patent · US Active

Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

US9557652B2 · kind B2 · utility

2Cited by

14References

22Claims

0Family size

Assignee

BASF SE

Inventors

Andreas Klipp · Lambsheim, DE
Andrei Honciuc · Iași, RO
Günter Oetter · Bischofswerda, DE
Christian Bittner · Bensheim, DE

Key dates

Filing date	Dec 4, 2013
Grant date	Jan 31, 2017
Priority date	—
Expiry date	Jan 26, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC11D2111/22
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In a method of treating a substrate including patterns having line-space dimensions of 50 nm or below, the substrate is rinsed by an aqueous composition including at least one non-ionic surfactant A and at least one hydrophobizer B. The at least one surfactant A has an equilibrium surface tension of 10 mN/m to 35 mN/m, determined from a solution of the at least one surfactant A in water at the critical micelle concentration. The hydrophobizer B is selected so that the contact angle of water to the substrate is increased by contacting the substrate with a solution of the hydrophobizer B in water by 5-95° compared to the contact angle of water to the substrate before such contacting.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.