Patent · US Active

Cold field electron emitters based on silicon carbide structures

US9558907B2 · kind B2 · utility

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15Claims
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Key dates

Filing dateJan 7, 2016
Grant dateJan 31, 2017
Priority date
Expiry dateJan 7, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/939
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A cold cathode field emission electron source capable of emission at levels comparable to thermal sources is described. Emission in excess of 6 A/cm2 at 7.5 V/μm is demonstrated in a macroscopic emitter array. The emitter has a monolithic and rigid porous semiconductor nanostructure with uniformly distributed emission sites, and is fabricated through a room temperature process which allows for control of emission properties. These electron sources can be used in a wide range of applications, including microwave electronics and x-ray imaging for medicine and security.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.