Patent · US Active

Metal complexes for use as dopants and other uses

US9559321B2 · kind B2 · utility

2Cited by

0References

11Claims

0Family size

Assignee

ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) · CH

Inventors

Julian Burschka · Darmstadt, DE
Florian Kessler · Höchstadt an der Aisch, DE
Etienne David Baranoff · Birmingham, GB
Mohammad Khaja Nazeeruddin · Ecublens, CH
Michael Graetzel · Yverdon-les-Bains, CH

Key dates

Filing date	Feb 24, 2012
Grant date	Jan 31, 2017
Priority date	—
Expiry date	Jun 27, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E60/10
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to electrochemical devices comprising complexes of cobalt comprising at least one ligand with a 5- or six membered, N-containing heteroring. The complex are useful as p- and n-dopants, as over of electrochemical devices, in particular in organic semiconductors. The complexes are further useful as over-discharge prevention and overvoltage protection agents.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.